Materialwiss. Master Wintersemester 2008/2009
06465 Method Course: Thin Film Analysis with Ion Beams [WPV]
Dozent Lindner J., Karl H.
Dauer 6 SWS
Studiensemester 0
Schein Ja (8 LP)
Termin Mo, 08:15 - 09:45, 2004/HZ
Beginn 13.10.2008
Inhalt This method course contains lectures and practical training. The lectures will be held as indicated and the practical training is planned to take place afterwards at 10:15 arranged by appointment.

The topics of the course are:
· Ion sources and accelerators, ion optics and detectors
· Atomic collisions and backscattering spectroscopy
· Stopping of ions in solids
· Rutherford Backscattering Spectroscopy (RBS):
Examples and Applications
· RBS depth resolution and sensitivity
· RBS with non-rutherfordian scattering cross sections
· Elastic Recoil Detection Analysis (ERDA) and Particle Induced X-Ray Analysis (PIXE)
· Ion channeling: Stopping, ion flux distributions in single crystals, defect analysis and adsorbate detection
· Secondary ion mass spectrometry (SIMS):
Fundamentals of sputter depth profiling, secondary ion formation and detection, examples, applications and interpretations of data

Moreover it is planned to visit an external ion beam facility.

The practical training will be performed with samples of current interest:
· Lab-tour, sample preparation, getting beam and RBS set-up
· Calibration of RBS spectra, practical issues
· Use of RUMP software for analysis of the measured spectra
· Ion channeling on crystalline Si
· SIMS sample requirement, parameter set-up
· SIMS depth profiling, ion microscopy