Suche

Microstructure analysis of novel ternary NiSi2-xAlxx silicide layers on Si(001) formed by solid-state reaction

A. Mogilatenko, G. Beddies, M. Falke, I. Häusler, and W. Neumann

erschienen 18.05.2012 J. Appl. Phys. 111, (2012) 103512. [DOI Link]