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Tailoring particle arrays by isotropic plasma etching: an approach towards percolated perpendicular media

C. Brombacher, M. Saitner, C. Pfahler, A. Plettl, P. Ziemann, D. Makarov, D. Assmann, M. Siekman, L. Abelmann, and M. Albrecht

erschienen 11.04.2009 Nanotechnology 20, (2009) 105304. [DOI Link]